Modification of optical and photoelectrical properties of thin gallium oxide films by intense pulsed 200 keV C+ ion beams / Zhanymgul Koishybayeva, Fedor Konusov, Sergey Pavlov [et al.]

Set Level: Optical Materials: X, Amsterdam, Elsevier Science Publishing Company Inc.Coauthor: Koishybayeva, Zh., Zhanymgul;Konusov, F. V., physicist, Lead Engineer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences, 1958-, Fedor Valerievich;Pavlov, S. K., physicist, Engineer of Tomsk Polytechnic University, 1990-, Sergey Konstantinovich;Sidelev, D. V., physicist, engineer of Tomsk Polytechnic University, 1991-, Dmitry Vladimirovich;Nassyrbayev (Nasyrbaev), A., Specialist in the field of electric power engineering, Research Engineer of Tomsk Polytechnic University, 1998-, Artur;Gadirov, R. M., Ruslan Mukhamedzhanovich;Tarbokov, V. A., specialist in the field of material science, Leading engineer of Tomsk Polytechnic University, Candidate of technical sciences, 1969-, Vladislav Aleksandrovich;Polisadova, E. F., specialist in the field of lighting engineering, professor of Tomsk Polytechnic University, doctor of physical and mathematical sciences, 1972-, Elena Fyodorovna;Akilbekov, A. T., Abdirash TasanovichLanguage: английский.Country: Netherlands.Abstract: In this work the effect of an intense pulsed ion irradiation with a high flux ∼1020 cm−2s−1 on structure, optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were produced by the radio-frequency magnetron sputtering method and had amorphous structure. A part of deposited films was annealed in the air environment (900 °C, 1 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the intense pulsed ion irradiation (ion energy - up to 200 keV, pulse duration - 100 ns, current density on the target - up to 30 A/cm2, number of pulses - 3). The influence of irradiation on optical absorption and photoluminescence spectra, field and temperature dependencies of dark and photoconductivity were investigated. The probable nature of growth defects is discussed, and a scheme of electronic transitions that determine optical properties is proposed.Bibliography: References: 38 tit.Subject: электронный ресурс | труды учёных ТПУ | Gallium oxide | Thin films | Magnetron sputtering | Pulsed ion irradiation | Photoconductivity | Optical properties Online Resources:https://doi.org/10.1016/j.omx.2025.100399
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References: 38 tit

In this work the effect of an intense pulsed ion irradiation with a high flux ∼1020 cm−2s−1 on structure, optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were produced by the radio-frequency magnetron sputtering method and had amorphous structure. A part of deposited films was annealed in the air environment (900 °C, 1 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the intense pulsed ion irradiation (ion energy - up to 200 keV, pulse duration - 100 ns, current density on the target - up to 30 A/cm2, number of pulses - 3). The influence of irradiation on optical absorption and photoluminescence spectra, field and temperature dependencies of dark and photoconductivity were investigated. The probable nature of growth defects is discussed, and a scheme of electronic transitions that determine optical properties is proposed

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