Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating / A. S. Grenadyorov, A. N. Zakharov, V. O. Oskirko [et al.] = Поток энергии на подложке при двойном магнетронном распылении покрытия TiAlN

Set Level: New York, Springer Science+Business Media LLC., Russian Physics JournalCoauthor: Grenadyorov, A. S., Aleksandr Sergeevich;Zakharov, A. N., Aleksandr Nikolaevich;Oskirko, V. O., Vladimir Olegovich;Sidelev, D. V., physicist, engineer of Tomsk Polytechnic University, 1991-, Dmitry Vladimirovich;Oskomov, K. V., Konstantin Vladimirovich;Solovjev, A. A., Andrey AleksandrovichCorporate Author (Secondary): National Research Tomsk Polytechnic University, (2009- )Language: английский ; of original work, русский.Country: США.Abstract: The paper suggests dependences of the energy flux and specific energy onto the substrate on the pulse duty cycle during the dual magnetron-sputter deposition of the TiAlN coating. It is shown that the energy flux at the substrate increases by 20–30% with decreasing duty cycle from 40 to 6% at the constant average discharge power. Together with a decrease in the deposition rate at the high pulsed power, the specific energy grows sixfold on the substrate during the coating growth. The duty cycle can be thus considered as a way to control the energy flux onto the deposited coating, which affects its structure and properties. It is found that the TiAlN coating obtained at low duty cycle and high energy flux onto the substrate, possesses the high hardness and wear resistance. .Bibliography: References: p. 1830-1831 (24 tit.).Subject: dual magnetron sputtering | TiAlN coating | energy flux | hardness | wear resistance | труды учёных ТПУ | электронный ресурс Online Resources:https://doi.org/10.1007/s11182-023-02837-z
Tags from this library: No tags from this library for this title. Log in to add tags.
Star ratings
    Average rating: 0.0 (0 votes)
No physical items for this record

References: p. 1830-1831 (24 tit.)

The paper suggests dependences of the energy flux and specific energy onto the substrate on the pulse duty cycle during the dual magnetron-sputter deposition of the TiAlN coating. It is shown that the energy flux at the substrate increases by 20–30% with decreasing duty cycle from 40 to 6% at the constant average discharge power. Together with a decrease in the deposition rate at the high pulsed power, the specific energy grows sixfold on the substrate during the coating growth. The duty cycle can be thus considered as a way to control the energy flux onto the deposited coating, which affects its structure and properties. It is found that the TiAlN coating obtained at low duty cycle and high energy flux onto the substrate, possesses the high hardness and wear resistance.

Текстовый файл

There are no comments on this title.

to post a comment.