Magnetron deposition of copper oxide coatings in a metallic mode enhanced by RF-ICP source: A role of substrate biasing / D. V. Sidelev, E. D. Voronina, G. A. Bleykher (Bleicher)

Set Level: VacuumMain Author: Sidelev, D. V., physicist, engineer of Tomsk Polytechnic University, 1991-, Dmitry VladimirovichCoauthor: Voronina, E. D., specialist in the field of nuclear technologies, engineer of Tomsk Polytechnic University, 2000-, Ekaterina Dmitrievna;Bleykher (Bleicher), G. A., physicist, Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences, 1961-, Galina AlekseevnaCorporate Author (Secondary): Национальный исследовательский Томский политехнический университет, Инженерная школа ядерных технологий, Научно-образовательный центр Б. П. ВейнбергаLanguage: английский.Abstract: The article describes deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source. The role of substrate biasing (floating potential, -70 and -140 V) on structural properties and elemental composition of copper oxide coatings is determined using SEM with EDS, XRD and TEM. This study shows the change of coating microstructure from columnar to dense/compact and the increase in crystallinity degree of coatings, when the substrate is biased. EDS analysis reveals the presence of Ar and the increase in O content in the coating due to intensive ion bombardment. Deposition conditions are changed using substrate biasing, which suggests the contribution of ion bombardment to the coating deposition in the case of magnetron sputtering of copper oxide in the metallic mode..Bibliography: [References: 25 tit.].Audience: .Subject: электронный ресурс | труды учёных ТПУ | magnetron sputtering | metallic mode | copper oxide | coating | substrate bias | RF-ICP source Online Resources:Click here to access online
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[References: 25 tit.]

The article describes deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source. The role of substrate biasing (floating potential, -70 and -140 V) on structural properties and elemental composition of copper oxide coatings is determined using SEM with EDS, XRD and TEM. This study shows the change of coating microstructure from columnar to dense/compact and the increase in crystallinity degree of coatings, when the substrate is biased. EDS analysis reveals the presence of Ar and the increase in O content in the coating due to intensive ion bombardment. Deposition conditions are changed using substrate biasing, which suggests the contribution of ion bombardment to the coating deposition in the case of magnetron sputtering of copper oxide in the metallic mode.

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